Open AccessGallium nitride thin films by microwave plasma-assisted ALD
Author(s) -
F. Romo-García,
H. J. Higuera-Valenzuela,
D. Cabrera-Germán,
D. Berman-Mendoza,
A. Ramos-Carrazco,
O. Contreras,
Rafael García
Publication year - 2019
Publication title -
optical materials express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.9.004187
Subject(s) - materials science , thin film , gallium nitride , atomic layer deposition , gallium , optoelectronics , indium gallium nitride , amorphous solid , nanocrystalline material , carbon film , analytical chemistry (journal) , layer (electronics) , optics , nanotechnology , physics , metallurgy , chemistry , organic chemistry , chromatography
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