Open AccessSelective etching of fs-laser inscribed high aspect ratio microstructures in YAG
Author(s) -
Kore Hasse,
G. Hüber,
Christian Kränkel
Publication year - 2019
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.9.003627
Subject(s) - etching (microfabrication) , materials science , diffusion , isotropic etching , aspect ratio (aeronautics) , phosphoric acid , optics , laser , reactive ion etching , analytical chemistry (journal) , optoelectronics , composite material , layer (electronics) , metallurgy , chemistry , physics , chromatography , thermodynamics
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