Open AccessSelective etching of fs-laser inscribed high aspect ratio microstructures in YAG
Author(s) -
Kore Hasse,
G. Huber,
Christian Kränkel
Publication year - 2019
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.9.003627
Subject(s) - materials science , etching (microfabrication) , optics , inscribed figure , laser , microstructure , optoelectronics , aspect ratio (aeronautics) , optical materials , nanotechnology , composite material , physics , layer (electronics) , geometry , mathematics