Open AccessRelief micro- and nanostructures by the reactive ion and chemical etching of poled glasses
Author(s) -
Igor Reduto,
A. N. Kamenskii,
P. N. Brunkov,
Valentina Zhurikhina,
Yuri Svirko,
A. A. Lipovskii
Publication year - 2019
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.9.003059
Subject(s) - reactive ion etching , materials science , etching (microfabrication) , isotropic etching , polishing , poling , layer (electronics) , flat glass , dry etching , anode , passivation , chemical mechanical planarization , electrode , optoelectronics , composite material , ferroelectricity , chemistry , dielectric