Open AccessTen years of two-color photolithography [Invited]
Author(s) -
Νικόλαος Λιάρος,
John T. Fourkas
Publication year - 2019
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.9.003006
Subject(s) - photolithography , lithography , computational lithography , next generation lithography , optics , materials science , extreme ultraviolet lithography , electron beam lithography , photomask , immersion lithography , nanotechnology , x ray lithography , maskless lithography , resolution (logic) , resist , computer science , optoelectronics , physics , artificial intelligence , layer (electronics)
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