Open AccessNanotrimer enhanced optical fiber tips implemented by electron beam lithography
Author(s) -
Ning Wang,
Matthias Zeisberger,
Uwe Hübner,
Markus A. Schmidt
Publication year - 2018
Publication title -
optical materials express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.8.002246
Subject(s) - materials science , electron beam lithography , optics , lithography , optoelectronics , optical fiber , maskless lithography , next generation lithography , stencil lithography , resist , nanotechnology , physics , layer (electronics)