Open AccessNanotrimer enhanced optical fiber tips implemented by electron beam lithography
Author(s) -
Ning Wang,
Matthias Zeisberger,
Uwe Hübner,
Markus A. Schmidt
Publication year - 2018
Publication title -
optical materials express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.8.002246
Subject(s) - materials science , electron beam lithography , planar , lithography , optical fiber , optics , optoelectronics , photonic crystal fiber , single mode optical fiber , fiber , maskless lithography , wafer , photonics , nanotechnology , wavelength , resist , physics , computer science , layer (electronics) , computer graphics (images) , composite material
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