Open AccessLarge area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons
Author(s) -
Hongchao Liu,
Yanhong Luo,
Weijie Kong,
Kaipeng Liu,
Wenjuan Du,
Chengwei Zhao,
Ping Gao,
Zeyu Zhao,
Changtao Wang,
Mingbo Pu,
Xiangang Luo
Publication year - 2018
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.8.000199
Subject(s) - materials science , interference lithography , surface plasmon polariton , plasmon , optics , lithography , interference (communication) , optoelectronics , period (music) , surface plasmon , electron beam lithography , polariton , nanotechnology , resist , fabrication , telecommunications , physics , medicine , channel (broadcasting) , alternative medicine , pathology , computer science , layer (electronics) , acoustics