Open AccessLarge area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons
Author(s) -
Hongchao Liu,
Yunfei Luo,
Weijie Kong,
Kaipeng Liu,
Wenjuan Du,
Chengwei Zhao,
Ping Gao,
Zeyu Zhao,
Changtao Wang,
Mingbo Pu,
Xiangang Luo
Publication year - 2018
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.8.000199
Subject(s) - materials science , optics , diffraction , interference lithography , lithography , optoelectronics , plasmon , wavelength , cladding (metalworking) , interference (communication) , surface plasmon polariton , surface plasmon , fabrication , physics , telecommunications , medicine , channel (broadcasting) , alternative medicine , pathology , computer science , metallurgy
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