Open AccessQuality evaluation of homopetaxial 4H-SiC thin films by a Raman scattering study of forbidden modes
Author(s) -
Lingyu Wan,
Dishu Zhao,
Fangze Wang,
Gu Xu,
Tao Lin,
ChinChe Tin,
Zhaochi Feng,
Zhe Chuan Feng
Publication year - 2017
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.8.000119
Subject(s) - silicon carbide , materials science , raman spectroscopy , quality (philosophy) , crystal (programming language) , optoelectronics , thin film , epitaxy , raman scattering , ultraviolet , silicon , optics , layer (electronics) , computer science , nanotechnology , physics , quantum mechanics , metallurgy , programming language
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