Open AccessArgon plasma etching of fused silica substrates for manufacturing high laser damage resistance optical interference coatings
Author(s) -
Kęstutis Juškevičius,
Rytis Buzelis,
Giedrius Abromavičius,
Romanas Samuilovas,
Saulė Abbas,
Alexandr Belosludtsev,
Ramutis Drazdys,
Simonas Kičas
Publication year - 2017
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.7.003598
Subject(s) - materials science , etching (microfabrication) , argon , laser , interference (communication) , optoelectronics , plasma , plasma etching , optical coating , optics , composite material , coating , layer (electronics) , physics , atomic physics , quantum mechanics , channel (broadcasting) , electrical engineering , engineering
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