Open AccessFunctional photoresists for sub-diffraction stimulated emission depletion lithography
Author(s) -
Richard Wollhofen,
Bianca Buchegger,
Christine Eder,
Jaroslaw Jacak,
Johannes Kreutzer,
Thomas A. Klar
Publication year - 2017
Publication title -
optical materials express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.7.002538
Subject(s) - materials science , lithography , diffraction , optics , resist , optoelectronics , immersion lithography , optical materials , electron beam lithography , photoresist , photolithography , nanotechnology , layer (electronics) , physics