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Effect of precursors on propagation loss for plasma-enhanced chemical vapor deposition of SiN_x:H waveguides
Author(s) -
E Douglas,
Patrick Mahony,
Andrew Starbuck,
Andrew Pomerene,
Douglas C. Trotter,
Christopher T. DeRose
Publication year - 2016
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.6.002892
Subject(s) - plasma enhanced chemical vapor deposition , materials science , chemical vapor deposition , fabrication , hydrogen , plasma , chemical bond , deposition (geology) , waveguide , optoelectronics , thermal , raman spectroscopy , optics , chemistry , organic chemistry , medicine , alternative medicine , pathology , meteorology , paleontology , physics , quantum mechanics , sediment , biology

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