Open AccessEffect of precursors on propagation loss for plasma-enhanced chemical vapor deposition of SiN_x:H waveguides
Author(s) -
Erica Ann Douglas,
Patrick Mahony,
Andrew Starbuck,
Andrew Pomerene,
Douglas C. Trotter,
Christopher T. DeRose
Publication year - 2016
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.6.002892
Subject(s) - chemical vapor deposition , materials science , plasma enhanced chemical vapor deposition , plasma , optoelectronics , plasma processing , deposition (geology) , optics , physics , paleontology , quantum mechanics , sediment , biology