Open AccessBulk sensing performance comparison between silicon dioxide and resonant high aspect ratio nanopillars arrays fabricated by means of interference lithography
Author(s) -
Iñaki Cornago,
Ana López Hernández,
Rafael Casquel,
Miguel Holgado,
María Fe Laguna Heras,
Francisco J. Sanza,
J. Bravo
Publication year - 2016
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.6.002264
Subject(s) - nanopillar , materials science , interference lithography , lithography , interference (communication) , optoelectronics , electron beam lithography , silicon dioxide , silicon , optics , x ray lithography , resist , nanotechnology , fabrication , nanostructure , telecommunications , channel (broadcasting) , medicine , alternative medicine , physics , pathology , layer (electronics) , computer science , metallurgy