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Bulk sensing performance comparison between silicon dioxide and resonant high aspect ratio nanopillars arrays fabricated by means of interference lithography
Author(s) -
Iñaki Cornago,
Ana López Hernández,
Rafael Casquel,
Miguel Holgado,
María Fe Laguna Heras,
Francisco J. Sanza,
Javier A. Bravo
Publication year - 2016
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.6.002264
Subject(s) - materials science , nanopillar , interference lithography , silicon , refractive index , silicon nitride , fabrication , optoelectronics , aspect ratio (aeronautics) , silicon dioxide , etching (microfabrication) , nanoimprint lithography , silicon oxide , electron beam lithography , lithography , optics , nanotechnology , resist , nanostructure , composite material , medicine , alternative medicine , physics , pathology , layer (electronics)

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