Open AccessFabrication and characterization of Ge_20As_20Se_15Te_45 chalcogenide glass for photonic crystal by nanoimprint lithography
Author(s) -
Peiqing Zhang,
Zheming Zhao,
Jianghui Zeng,
Qian Zhang,
Xunsi Wang,
Feifei Chen,
Xiang Shen,
Shixun Dai
Publication year - 2016
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.6.001853
Subject(s) - nanoimprint lithography , materials science , chalcogenide glass , resist , fabrication , chalcogenide , photonic crystal , thermal stability , optoelectronics , refractive index , lithography , optics , photonics , nanotechnology , medicine , alternative medicine , pathology , physics , layer (electronics) , quantum mechanics
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