Open AccessShort-term damage and its mechanism of a CaF2 window for a DUV lithography machine
Author(s) -
Xin Guo,
Xiangwei Zhu,
Rui Jiang,
Bin Liu,
Huiwen Zong,
Shengping Shen
Publication year - 2022
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.468121
Subject(s) - materials science , irradiation , composite material , laser , particle (ecology) , power density , radiation damage , radiation , optics , power (physics) , oceanography , physics , quantum mechanics , nuclear physics , geology