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Film structure and optical characteristics of a-Si:H prepared with a rotary table type layer-by-layer sputtering method for application in short-wave near-infrared filters
Author(s) -
Yoshio Kawamata,
Daisuke Ono,
Hiroshi Itô,
Hiroyuki Nikkuni,
Mikio Ito
Publication year - 2022
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.462238
Subject(s) - sputtering , materials science , molar absorptivity , refractive index , amorphous solid , attenuation coefficient , annealing (glass) , analytical chemistry (journal) , silicon , layer (electronics) , optoelectronics , optics , thin film , composite material , nanotechnology , crystallography , chemistry , organic chemistry , physics

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