Open AccessRapid photolithographic fabrication of high density optical interconnects using refractive index contrast polymers
Author(s) -
Julie I. Frish,
Tristan S. Kleine,
Roland Himmelhuber,
Sasaan A. Showghi,
Abhinav Nishant,
KyungJo Kim,
Linan Jiang,
Kaitlyn P Martin,
Lars Brusberg,
Stanley Pau,
Thomas Koch,
Jeffrey Pyun,
Robert A. Norwood
Publication year - 2022
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.454195
Subject(s) - materials science , refractive index , refractive index contrast , optoelectronics , fabrication , dry etching , etching (microfabrication) , polymer , photonics , lithography , photolithography , high refractive index polymer , silicon , reactive ion etching , nanoimprint lithography , optics , nanotechnology , composite material , layer (electronics) , medicine , alternative medicine , physics , pathology