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Rapid photolithographic fabrication of high density optical interconnects using refractive index contrast polymers
Author(s) -
Julie I. Frish,
Tristan S. Kleine,
Roland Himmelhuber,
Sasaan A. Showghi,
Abhinav Nishant,
KyungJo Kim,
Linan Jiang,
Kaitlyn P. Martin,
Lars Brusberg,
Stanley Pau,
Thomas Koch,
Jeffrey Pyun,
Robert A. Norwood
Publication year - 2022
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.454195
Subject(s) - materials science , refractive index , refractive index contrast , optoelectronics , fabrication , dry etching , etching (microfabrication) , polymer , lithography , photonics , photolithography , silicon , reactive ion etching , nanoimprint lithography , optics , nanotechnology , composite material , layer (electronics) , medicine , alternative medicine , physics , pathology

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