Open AccessInfluence of temperature and plasma parameters on the properties of PEALD HfO2
Author(s) -
Margarita Lapteva,
Vivek Beladiya,
Sebastian Riese,
Phillip Hanke,
Félix Otto,
Torsten Fritz,
P. Schmitt,
Olaf Stenzel,
Andreas Tünnermann,
Adriana Szeghalmi
Publication year - 2021
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.422156
Subject(s) - materials science , refractive index , atomic layer deposition , thin film , dielectric , high refractive index polymer , optoelectronics , plasma , laser , deposition (geology) , optical coating , absorption (acoustics) , semiconductor , hafnium , optics , composite material , nanotechnology , zirconium , paleontology , physics , quantum mechanics , sediment , biology , metallurgy