z-logo
open-access-imgOpen Access
Influence of low-temperature GaN-Cap layer thickness on the InGaN/GaN multiple quantum well structure and its luminescence
Author(s) -
Yuntao Zhao,
Guanghui Li,
Shuai Zhang,
Feng Liang,
Mei Zhou,
Degang Zhao,
Desheng Jiang
Publication year - 2021
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.420877
Subject(s) - materials science , luminescence , indium , optoelectronics , quantum efficiency , layer (electronics) , quantum well , indium gallium nitride , cathodoluminescence , optics , gallium nitride , composite material , laser , physics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom