Open AccessEffect on nanoscale damage precursors of fused silica with wet etching in KOH solutions
Author(s) -
Yaoyu Zhong,
Yifan Dai,
Ye Tian,
Feng Shi
Publication year - 2021
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.419610
Subject(s) - materials science , photothermal therapy , nanoscopic scale , etching (microfabrication) , isotropic etching , surface roughness , impurity , surface finish , absorption (acoustics) , ultraviolet , nanotechnology , chemical engineering , optoelectronics , composite material , layer (electronics) , chemistry , organic chemistry , engineering