Open AccessRoom temperature plasma-etching and surface passivation of far-ultraviolet Al mirrors using electron beam generated plasmas
Author(s) -
Luis Rodríguez-de Marcos,
David R. Boris,
Emrold Gray,
Javier G. Del Hoyo,
Alexander C. Kozen,
Joseph G. Richardson,
Samantha G. Rosenberg,
Scott G. Walton,
Virginia D. Wheeler,
Edward J. Wollack,
J. Woodward,
Manuel A. Quijada
Publication year - 2021
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.417475
Subject(s) - passivation , materials science , plasma , ultraviolet , optoelectronics , etching (microfabrication) , optics , layer (electronics) , deposition (geology) , chemical vapor deposition , thin film , analytical chemistry (journal) , nanotechnology , chemistry , physics , paleontology , quantum mechanics , chromatography , sediment , biology