Open AccessDirect laser writing lithography using a negative-tone electron-beam resist
Author(s) -
H. S. Kim,
Byung Hee Son,
Y. C. Kim,
Y. H. Ahn
Publication year - 2020
Publication title -
optical materials express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.409302
Subject(s) - laser linewidth , resist , materials science , lithography , photoresist , electron beam lithography , optics , x ray lithography , next generation lithography , laser , photolithography , optoelectronics , extreme ultraviolet lithography , nanotechnology , physics , layer (electronics)