Open AccessOptical properties of UV-transparent aluminum oxide / aluminum fluoride mixture films, prepared by plasma-ion assisted evaporation and ion beam sputtering
Author(s) -
Olaf Stenzel,
Steffen Wilbrandt,
Shan Yi Du,
Christian Franke,
Norbert Kaiser,
Andreas Tünnermann,
Mathias Mende,
Henrik Ehlers,
Mario Held
Publication year - 2014
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.4.001696
Subject(s) - materials science , sputtering , evaporation , fluoride , ion , aluminium , aluminum oxide , ion beam , oxide , plasma , ion beam deposition , optoelectronics , thin film , optics , inorganic chemistry , composite material , nanotechnology , metallurgy , chemistry , physics , organic chemistry , thermodynamics , quantum mechanics
Electron beam evaporation (without and with plasma assistance) as well as ion beam sputtering are used to prepare optical mixture coatings for applications in the ultraviolet spectral range. It is demonstrated that intermixing aluminum oxide/ aluminum fluoride materials by these physical vapor deposition techniques results in optical coatings with flexible refractive indices varying between 1.40 and 1.75 in the deep ultraviolet spectral region. At the same time, extinction coefficients vary between less than 1x10-4 and 2x10-3. For evaporated layers, at certain mixture ratios, mechanical stress appears to be close to zero