Open AccessGrowth and characterization of low-temperature Si1-xSnx on Si using plasma enhanced chemical vapor deposition
Author(s) -
Seyedeh Fahimeh Banihashemian,
Joshua M. Grant,
Abbas Sabbar,
Ha Nguyen Tran,
Oluwatobi Olorunsola,
Solomon Ojo,
Sylvester Amoah,
Mehrshad Mehboudi,
Shui-Qing Yu,
Aboozar Mosleh,
Hameed A. Naseem
Publication year - 2020
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.398958
Subject(s) - x ray photoelectron spectroscopy , chemical vapor deposition , materials science , tin , analytical chemistry (journal) , silicon , thin film , epitaxy , substrate (aquarium) , x ray crystallography , x ray spectroscopy , plasma enhanced chemical vapor deposition , diffraction , spectroscopy , chemical engineering , nanotechnology , optoelectronics , chemistry , optics , metallurgy , layer (electronics) , oceanography , physics , chromatography , geology , engineering , quantum mechanics