Growth and characterization of low-temperature Si1-xSnx on Si using plasma enhanced chemical vapor deposition | Zendy

Seyedeh Fahimeh Banihashemian | Zendy; Joshua M. Grant | Zendy; Abbas Sabbar | Zendy; Huong Tran | Zendy; Oluwatobi Olorunsola | Zendy; Solomon Ojo | Zendy; Sylvester Amoah | Zendy; Mehrshad Mehboudi | Zendy; Shui-Qing Yu | Zendy; Aboozar Mosleh | Zendy; Hameed A. Naseem | Zendy

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Growth and characterization of low-temperature Si_1-xSn_x on Si using plasma enhanced chemical vapor deposition

Author(s) -

Seyedeh Fahimeh Banihashemian,

Joshua M. Grant,

Abbas Sabbar,

Huong Tran,

Oluwatobi Olorunsola,

Solomon Ojo,

Sylvester Amoah,

Mehrshad Mehboudi,

Shui-Qing Yu,

Aboozar Mosleh,

Hameed A. Naseem

Publication year - 2020

Publication title -

optical materials express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.925

H-Index - 66

ISSN - 2159-3930

DOI - 10.1364/ome.398958

Subject(s) - x ray photoelectron spectroscopy , chemical vapor deposition , materials science , analytical chemistry (journal) , tin , silicon , thin film , epitaxy , substrate (aquarium) , x ray crystallography , plasma enhanced chemical vapor deposition , x ray spectroscopy , diffraction , spectroscopy , nanotechnology , chemical engineering , optoelectronics , optics , chemistry , metallurgy , layer (electronics) , oceanography , physics , chromatography , quantum mechanics , geology , engineering

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