Open AccessRelative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al2O3 layers
Author(s) -
Carlijn I. van Emmerik,
Ward A. P. M. Hendriks,
Martijn Leendert Stok,
Michiel de Goede,
Lantian Chang,
Meindert Dijkstra,
Franciscus B. Segerink,
Dominic Post,
Enrico G. Keim,
Mike J. Dikkers,
Sonia M. García-Blanco
Publication year - 2020
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.393058
Subject(s) - materials science , sputtering , refractive index , wafer , amorphous solid , optoelectronics , doping , atomic layer deposition , sputter deposition , deposition (geology) , cavity magnetron , layer (electronics) , thin film , nanotechnology , paleontology , chemistry , organic chemistry , sediment , biology