Open AccessRelative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al2O3 layers
Author(s) -
Carlijn I. van Emmerik,
Ward Hendriks,
Martijn M. Stok,
Michiel de Goede,
Lantian Chang,
Meindert Dijkstra,
F. B. Segerink,
Dominic Post,
Enrico G. Keim,
Mike J. Dikkers,
Sonia M. GarcíaBlanco
Publication year - 2020
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.393058
Subject(s) - materials science , sputtering , wafer , amorphous solid , refractive index , optoelectronics , doping , sputter deposition , atomic layer deposition , cavity magnetron , deposition (geology) , layer (electronics) , thin film , nanotechnology , chemistry , paleontology , organic chemistry , sediment , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom