Open AccessOrigin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers
Author(s) -
Colin Harthcock,
Siyao Qiu,
Paul B. Mirkarimi,
Raluca A. Negres,
Gabe Guss,
Marlon G. Menor,
Gourav Bhowmik,
Mengbing Huang
Publication year - 2020
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.389416
Subject(s) - hafnia , materials science , stoichiometry , analytical chemistry (journal) , band gap , argon , sputtering , laser , thin film , optics , optoelectronics , atomic physics , nanotechnology , composite material , chemistry , cubic zirconia , ceramic , physics , organic chemistry , chromatography
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