Open AccessScaling of black silicon processing time by high repetition rate femtosecond lasers
Author(s) -
Giorgio Nava,
Roberto Osellame,
Roberta Ramponi,
Krishna Chaitanya Vishnubhatla
Publication year - 2013
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.3.000612
Subject(s) - femtosecond , materials science , laser , silicon , optics , scaling , optoelectronics , repetition (rhetorical device) , black silicon , materials processing , physics , geometry , mathematics , linguistics , philosophy , engineering , manufacturing engineering
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