Open AccessGe_2Sb_15Bi_05Te_5 thin film as inorganic photoresist
Author(s) -
Hongzhu Xi,
Qian Liu,
Ye Tian,
Yongsheng Wang,
Shengming Guo,
Maoyou Chu
Publication year - 2012
Publication title -
optical materials express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.2.000461
Subject(s) - photoresist , materials science , thin film , optoelectronics , optics , nanotechnology , layer (electronics) , physics
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