Open AccessOptical and compositional properties of amorphous silicon-germanium films by plasma processing for integrated photonics
Author(s) -
William W. Hernández-Montero,
I. E. Zaldívar-Huerta,
Carlos ZúňigaIslas,
A. TorresJácome,
C. Reyes-Betanzo,
Adrián Itzmoyotl-Toxqui
Publication year - 2012
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.2.000358
Subject(s) - materials science , plasma enhanced chemical vapor deposition , germanium , refractive index , amorphous silicon , silicon , optoelectronics , optics , chemical vapor deposition , amorphous solid , transmittance , photolithography , waveguide , absorption (acoustics) , crystalline silicon , chemistry , physics , organic chemistry , composite material