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Direct measurement of the negative Goos–Hänchen shift of single reflection in a two-dimensional photonic crystal with negative refractive index
Author(s) -
Qiang Jiang,
Jiabi Chen,
Binming Liang,
Yan Wang,
Jinbing Hu,
Songlin Zhuang
Publication year - 2017
Publication title -
optics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.524
H-Index - 272
eISSN - 1071-2763
pISSN - 0146-9592
DOI - 10.1364/ol.42.001213
Subject(s) - optics , refractive index , photonic crystal , total internal reflection , negative refraction , reflection (computer programming) , materials science , total external reflection , optoelectronics , physics , computer science , programming language
The negative Goos-Hänchen shift (GHS) on a two-dimensional photonic crystal with an effective negative refractive index is investigated by simulation and experiment. The measured refractive index of the fabricated photonic crystal is nearly -0.44. The difference between the Goos-Hänchen shift of the transverse electric wave G TE and that of the transverse magnetic wave G TM (DGHS) in the height direction of a silicon rod is measured at three incident angles. The result shows that DGHS is always smaller than -G TM , thus G TE <0; therefore, the negative GHS does occur on the surface of the photonic crystal with a negative refractive index.

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