Open AccessHigh efficiency Al/Sc-based multilayer coatings in the EUV wavelength range above 40 nanometers
Author(s) -
Jennifer Rebellato,
Régina Soufli,
Evgueni Meltchakov,
Eric M. Gullikson,
Sébastien de Rossi,
Franck Delmotte
Publication year - 2020
Publication title -
optics letters/optics index
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.524
H-Index - 272
eISSN - 1071-2763
pISSN - 0146-9592
DOI - 10.1364/ol.384734
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , optics , materials science , wavelength , ultraviolet , optoelectronics , nanometre , laser , physics
In this Letter, we have developed new and highly efficient periodic multilayer mirrors Al/Sc, Al/Sc/SiC, and Mo/Al/Sc with optimized reflectance at wavelengths between 40 and 65 nm. We have reached record values in measured peak reflectance: 57.5% at 44.7 nm and 46.5% at 51 nm, with Al/Sc/SiC at near-normal incidence. Furthermore, to the best of our knowledge, we have achieved the largest reported bandwidth with Mo/Al/Sc at 57 nm and the narrowest bandwidth with Al/Sc at a 60 nm wavelength. These new and promising results demonstrate that Al/Sc-based multilayer coatings are excellent candidates for future generations of extreme ultraviolet (EUV) instruments for solar physics, EUV lasers, and attosecond science, in a wavelength range that has not been fully explored.