Open AccessTowards efficient structure prediction and pre-compensation in multi-photon lithography: publisher’s note
Author(s) -
Nicolas Lang,
Sven Enns,
Julian Hering,
Georg von Freymann
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.473590
Subject(s) - optics , lithography , photon , compensation (psychology) , electron beam lithography , physics , materials science , nanotechnology , resist , psychology , layer (electronics) , psychoanalysis