z-logo
open-access-imgOpen Access
High-performance quantum cascade lasers at λ ∼ 9 µm grown by MOCVD
Author(s) -
Yongqiang Sun,
Ran Yin,
Jinchuan Zhang,
Junqi Liu,
Fei Teng,
Kun Li,
Kai Guo,
Zhiwei Jia,
Shuman Liu,
Quanyong Lu,
Ning Zhuo,
Lijun Wang,
Fengqi Liu,
Shenqiang Zhai
Publication year - 2022
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.469573
Subject(s) - materials science , metalorganic vapour phase epitaxy , full width at half maximum , optoelectronics , quantum cascade laser , cascade , laser , optics , chemical vapor deposition , slope efficiency , quantum efficiency , reflection coefficient , continuous wave , wavelength , physics , fiber laser , epitaxy , chemistry , layer (electronics) , chromatography , terahertz radiation , composite material
We demonstrate a high power InP-based quantum cascade laser (QCL) (λ ∼ 9 µm) with high characteristic temperature grown by metalorganic chemical vapor deposition (MOCVD) in this article. A 4-mm-long cavity length, 10.5-µm-wide ridge QCL with high-reflection (HR) coating demonstrates a maximum pulsed peak power of 1.55 W and continuous-wave (CW) output power of 1.02W at 293 K. The pulsed threshold current density of the device is as low as 1.52 kA/cm 2 . The active region adopted a dual-upper-state (DAU) and multiple-lower-state (MS) design and it shows a wide electroluminescence (EL) spectrum with 466 cm -1 wide full-width at half maximum (FWHM). In addition, the device performance is insensitive to the temperature change since the threshold-current characteristic temperature coefficient, T 0 , is as high as 228 K, and slope-efficiency characteristic temperature coefficient, T 1 , is as high as 680 K, over the heatsink-temperature range of 293 K to 353 K.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom