Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an example | Zendy

Huwen Ding | Zendy; Lihong Liu | Zendy; Lisong Dong | Zendy; Dandan Han | Zendy; Taian Fan | Zendy; Libin Zhang | Zendy; Yayi Wei | Zendy

Open Access

Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an example

Author(s) -

Huwen Ding,

Lihong Liu,

Lisong Dong,

Dandan Han,

Taian Fan,

Libin Zhang,

Yayi Wei

Publication year - 2022

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.465650

Subject(s) - lithography , optics , superlens , next generation lithography , plasmon , photolithography , extreme ultraviolet lithography , multiple patterning , computational lithography , nanolithography , materials science , surface plasmon polariton , x ray lithography , optoelectronics , nanophotonics , nanoimprint lithography , surface plasmon , physics , resist , electron beam lithography , metamaterial , nanotechnology , fabrication , medicine , alternative medicine , layer (electronics) , pathology

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