Open AccessStudy on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an example
Author(s) -
Huwen Ding,
Lihong Liu,
Lisong Dong,
Dong Han,
Taian Fan,
Libin Zhang,
Yayi Wei
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.465650
Subject(s) - lithography , optics , superlens , next generation lithography , plasmon , photolithography , extreme ultraviolet lithography , multiple patterning , computational lithography , nanolithography , materials science , surface plasmon polariton , x ray lithography , optoelectronics , nanophotonics , nanoimprint lithography , surface plasmon , physics , resist , electron beam lithography , metamaterial , nanotechnology , fabrication , medicine , alternative medicine , layer (electronics) , pathology