Open AccessAbsolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme
Author(s) -
Johann J. Abel,
Felix Wiesner,
Jan Nathanael,
Julius Reinhard,
Martin Wünsche,
G. Schmidl,
Annett Gawlik,
Uwe Hübner,
Jonathan Plentz,
Christian Roedel,
Gerhard G. Paulus,
Silvio Fuchs
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.463216
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , optics , synchrotron radiation , materials science , spectroscopy , absorption (acoustics) , synchrotron , reflection (computer programming) , physics , laser , quantum mechanics , computer science , programming language
We present a tabletop setup for extreme ultraviolet (EUV) reflection spectroscopy in the spectral range from 40 to 100 eV by using high-harmonic radiation. The simultaneous measurements of reference and sample spectra with high energy resolution provide precise and robust absolute reflectivity measurements, even when operating with spectrally fluctuating EUV sources. The stability and sensitivity of EUV reflectivity measurements are crucial factors for many applications in attosecond science, EUV spectroscopy, and nano-scale tomography. We show that the accuracy and stability of our in situ referencing scheme are almost one order of magnitude better in comparison to subsequent reference measurements. We demonstrate the performance of the setup by reflective near-edge x-ray absorption fine structure measurements of the aluminum L 2/3 absorption edge in α-Al 2 O 3 and compare the results to synchrotron measurements.