Open AccessMethod for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method
Author(s) -
JinSu Choi,
Geehong Kim,
Lee Ws,
Won Seok Chang,
Hongki Yoo
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.460780
Subject(s) - maskless lithography , digital micromirror device , photomask , lithography , microfabrication , optics , materials science , photolithography , duty cycle , microelectromechanical systems , computer science , quality (philosophy) , image quality , fabrication , optoelectronics , nanotechnology , artificial intelligence , resist , electron beam lithography , physics , voltage , engineering , electrical engineering , medicine , alternative medicine , layer (electronics) , pathology , quantum mechanics , image (mathematics)