Open AccessMethod for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method
Author(s) -
Jinsu Choi,
Geehong Kim,
Won-Sup Lee,
Won Seok Chang,
Hongki Yoo
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.460780
Subject(s) - digital micromirror device , maskless lithography , photomask , lithography , microfabrication , optics , materials science , duty cycle , photolithography , computer science , microelectromechanical systems , pixel , fabrication , optoelectronics , nanotechnology , resist , electron beam lithography , physics , voltage , engineering , electrical engineering , medicine , alternative medicine , layer (electronics) , pathology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom