Improvement of imaging performance of silicon micropore X-ray optics by ultra long-term annealing
Author(s) -
Aoto Fukushima,
Daiki Ishi,
Yuichiro Ezoe,
Kumi Ishikawa,
Masaki Numazawa,
Sae Sakuda,
Tomoki Uchino,
A. Inagaki,
Yôko Ueda,
Hiromi Morishita,
Luna Sekiguchi,
Takatoshi Murakawa,
Yukine Tsuji,
Kazuhisa Mitsuda,
Yoshiaki Kanamori
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.459774
Subject(s) - full width at half maximum , optics , wafer , materials science , deep reactive ion etching , x ray optics , annealing (glass) , angular resolution (graph drawing) , image resolution , silicon , optoelectronics , x ray , etching (microfabrication) , physics , reactive ion etching , nanotechnology , mathematics , layer (electronics) , combinatorics , composite material
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