Open AccessInformatics-based computational lithography for phase-shifting mask optimization
Author(s) -
Yihua Pan,
Xu Ma
Publication year - 2022
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.459095
Subject(s) - computational lithography , lithography , photolithography , computer science , fidelity , mutual information , next generation lithography , extreme ultraviolet lithography , x ray lithography , immersion lithography , maskless lithography , optics , resist , materials science , artificial intelligence , electron beam lithography , nanotechnology , physics , telecommunications , layer (electronics)