Open AccessI-line photolithographic metalenses enabled by distributed optical proximity correction with a deep-learning model
Author(s) -
Wei-Ping Liao,
Hsuehli Liu,
Yu-Fan Lin,
Sheng-Siang Su,
Yuteng Chen,
Guan-Bo Lin,
Tsung-Chieh Tseng,
Tong-Ke Lin,
ChunChi Chen,
WeiHsiang Huang,
Shih-Wei Chen,
JiaMin Shieh,
Peichen Yu,
You-Chia Chang
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.456469
Subject(s) - photolithography , photomask , critical dimension , lithography , optical proximity correction , photoresist , computational lithography , reticle , optics , materials science , extreme ultraviolet lithography , optoelectronics , line (geometry) , numerical aperture , computer science , nanotechnology , multiple patterning , resist , physics , wafer , wavelength , geometry , mathematics , layer (electronics)