I-line photolithographic metalenses enabled by distributed optical proximity correction with a deep-learning model | Zendy

Wei-Ping Liao | Zendy; Hsuehli Liu | Zendy; Yu-Fan Lin | Zendy; Sheng-Siang Su | Zendy; Yuteng Chen | Zendy; Guan-Bo Lin | Zendy; Tsung-Chieh Tseng | Zendy; Tong-Ke Lin | Zendy; Chun-Chi Chen | Zendy; Wen-Hsien Huang | Zendy; ShihWei Chen | Zendy; JiaMin Shieh | Zendy; Peichen Yu | Zendy; You-Chia Chang | Zendy

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I-line photolithographic metalenses enabled by distributed optical proximity correction with a deep-learning model

Author(s) -

Wei-Ping Liao,

Hsuehli Liu,

Yu-Fan Lin,

Sheng-Siang Su,

Yuteng Chen,

Guan-Bo Lin,

Tsung-Chieh Tseng,

Tong-Ke Lin,

Chun-Chi Chen,

Wen-Hsien Huang,

ShihWei Chen,

JiaMin Shieh,

Peichen Yu,

You-Chia Chang

Publication year - 2022

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.456469

Subject(s) - photolithography , photomask , critical dimension , lithography , optical proximity correction , photoresist , computational lithography , optics , reticle , materials science , extreme ultraviolet lithography , optoelectronics , line (geometry) , numerical aperture , nanotechnology , multiple patterning , resist , physics , wafer , wavelength , geometry , mathematics , layer (electronics)

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