Sub-50 nm control of light at 405 nm with planar Si nanolens | Zendy

Zhong Wang | Zendy; Muling Chen | Zendy; Weihua Zhang | Zendy

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Sub-50 nm control of light at 405 nm with planar Si nanolens

Author(s) -

Zhong Wang,

Muling Chen,

Weihua Zhang

Publication year - 2022

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.453588

Subject(s) - optics , photolithography , materials science , planar , light beam , refractive index , gaussian , light field , visible spectrum , focus (optics) , optoelectronics , physics , computer science , quantum mechanics , computer graphics (images)

We studied the super-resolution light modulation capability of Si nanodisks, a flat semi-transparent high index nanolens in the visible spectral range. A Laguerre-Gaussian beam-based optimization algorithm was developed to synthesize desired field distributions. Focused spots below 45 nm (< λ/9) were successfully achieved with 405 nm light over the whole center area of the nanolens. This superb light nano-focusing capability allows us to synthesize complex nano-patterns by simply superposing several focus spots together, making the Si nanolens a promising tool for super-resolution photolithography.

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