Open AccessSub-50 nm control of light at 405 nm with planar Si nanolens
Author(s) -
Zhong Wang,
Muling Chen,
Weihua Zhang
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.453588
Subject(s) - optics , photolithography , materials science , planar , light beam , refractive index , gaussian , light field , visible spectrum , focus (optics) , optoelectronics , physics , computer science , quantum mechanics , computer graphics (images)