Open AccessFast aerial image model for EUV lithography using the adjoint fully convolutional network
Author(s) -
Jiaxin Lin,
Lisong Dong,
Taian Fan,
Xu Ma,
Yayi Wei
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.452420
Subject(s) - aerial image , extreme ultraviolet lithography , optics , lithography , computer science , algorithm , kernel (algebra) , feature (linguistics) , parametric statistics , artificial intelligence , physics , image (mathematics) , mathematics , linguistics , philosophy , statistics , combinatorics