Open AccessInverted Hartmann mask made by deep X-ray lithography for single-shot multi-contrast X-ray imaging with laboratory setup
Author(s) -
Andrey Mikhaylov,
Margarita Zakharova,
Vitor Vlnieska,
Ankita Khanda,
Sabine Bremer,
M. S. Zubér,
Sérgio Henrique Pezzin,
N. Kunka
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.452114
Subject(s) - lithography , materials science , optics , resist , x ray lithography , liga , fabrication , optoelectronics , nanotechnology , physics , medicine , alternative medicine , layer (electronics) , pathology