Inverted Hartmann mask made by deep X-ray lithography for single-shot multi-contrast X-ray imaging with laboratory setup
Author(s) -
Andrey Mikhaylov,
Margarita Zakharova,
Vitor Vlnieska,
Ankita Khanda,
Sabine Bremer,
M. S. Zubér,
Sérgio Henrique Pezzin,
N. Kunka
Publication year - 2022
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.452114
Subject(s) - lithography , materials science , optics , resist , x ray lithography , liga , fabrication , optoelectronics , nanotechnology , physics , medicine , alternative medicine , layer (electronics) , pathology
This paper reports on the fabrication and characterization of an inverted Hartmann mask and its application for multi-contrast X-ray imaging of polymer composite material in a laboratory setup. Hartmann masks open new possibilities for high-speed X-ray imaging, obtaining orientation-independent information on internal structures without rotating the object. The mask was manufactured with deep X-ray lithography and gold electroplating on a low-absorbing polyimide substrate. Such an approach allows us to produce gratings with a small period and high aspect ratio, leading to a higher spatial resolution and extension towards higher X-ray energies. Tuning the manufacturing process, we achieved a homogeneous patterned area without supporting structures, thus avoiding losses on visibility. We tested mask performance in a laboratory setup with a conventional flat panel detector and assessed mask imaging capabilities using a tailored phantom sample of various sizes. We performed multi-modal X-ray imaging of epoxy matrix polymer composites reinforced with glass fibers and containing microcapsules filled with a healing agent. Hartmann masks made by X-ray lithography enabled fast-tracking of structural changes in low absorbing composite materials and of a self-healing mechanism triggered by mechanical stress.
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