Open AccessMaximizing energy utilization in DMD-based projection lithography
Author(s) -
Mingjie Deng,
Yuanyuan Zhao,
Zi-Xin Liang,
Jingtao Chen,
Yang Zhang,
XuanMing Duan
Publication year - 2022
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.448231
Subject(s) - optics , diffraction , diffraction efficiency , photolithography , digital micromirror device , materials science , wavelength , lithography , laser , projection (relational algebra) , energy conversion efficiency , optoelectronics , diffraction grating , physics , computer science , algorithm