z-logo
open-access-imgOpen Access
High conductivity n-Al0.6Ga0.4N by ammonia-assisted molecular beam epitaxy for buried tunnel junctions in UV emitters
Author(s) -
Jianfeng Wang,
Burhan K. SaifAddin,
Christian J. Zollner,
Bastien Bonef,
Abdullah Almogbel,
Yifan Yao,
Michael Iza,
Yuewei Zhang,
Micha N. Fireman,
Erin C. Young,
Steven P. DenBaars,
Shuji Nakamura,
James S. Speck
Publication year - 2021
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.436153
Subject(s) - materials science , molecular beam epitaxy , ohmic contact , light emitting diode , analytical chemistry (journal) , doping , optoelectronics , substrate (aquarium) , metalorganic vapour phase epitaxy , epitaxy , scanning electron microscope , silicon , optics , nanotechnology , chemistry , oceanography , physics , layer (electronics) , chromatography , geology , composite material

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom