Open AccessFormation mechanism of nanosecond-laser-induced microstructures on amorphous silicon film surfaces
Author(s) -
Yingming Ren,
Zhe Zhang
Publication year - 2021
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.434313
Subject(s) - materials science , microstructure , nanosecond , laser , optics , silicon , amorphous solid , irradiation , optoelectronics , amorphous silicon , laser power scaling , surface roughness , crystalline silicon , composite material , chemistry , physics , organic chemistry , nuclear physics
Laser-induced microstructures have attracted significant research interest owing to their wide application potential for anti-reflective surfaces and optoelectronic devices. To elucidate the characteristics of laser-patterned microstructures, nanosecond-laser-induced micro-protrusions on amorphous silicon film surfaces were investigated via single-and multi-line irradiation experiments. For the former, the results reveal that the number of periodic micro-protrusions depends on the peak power intensity. In addition, the height and the base diameter of the micro-protrusions can be tailored by adjusting the peak power intensity and scanning distance of the laser, while increasing the peak power intensity also increases surface roughness. X-ray spectroscopy confirmed that the microstructures were mainly composed of silicon. The relationship between the formation mechanism and the size of the micro-protrusions is also discussed, with the results of this study providing valuable insights into the laser-induced microstructure formation.