Open AccessSingle-shot spectrally resolved interferometry for the simultaneous measurement of the thickness and surface profile of multilayer films
Author(s) -
Young-Sik Ghim,
Yong Bum Seo,
Ki-Nam Joo,
Hyug-Gyo Rhee
Publication year - 2021
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.432549
Subject(s) - optics , achromatic lens , materials science , interferometry , ellipsometry , metrology , wavelength , stylus , astronomical interferometer , spectrometer , phase (matter) , profilometer , polarization (electrochemistry) , white light interferometry , surface finish , thin film , physics , chemistry , quantum mechanics , acoustics , nanotechnology , composite material
We present a single-shot spectrally-resolved interferometry for simultaneously measuring the film thickness and surface profile of each layer of a patterned multilayer film structure. For this purpose, we implemented an achromatic phase shifting method based on the geometric phase using the polarization characteristics of the light and obtained four phase-shifted interferograms in the spectrally-resolved fringe pattern at the same time by combining a pixelated polarizing camera with an imaging spectrometer. As a result, we could simultaneously measure the reflectance and phase of the sample over a wide wavelength range with a single measurement. To evaluate the validity of the proposed method, we measured a patterned five-layer film specimen and compared our measurement results with those from commercial instruments, an ellipsometer and a stylus profiler, respectively. We confirmed the results matched each other well.