Open Access1-keV emission from laser-plasma source based on an Xe/He double stream gas puff target
Author(s) -
P. Wachulak,
Tomasz Fok,
Łukasz Węgrzyński,
Andrzej Bartnik,
Piotr Nyga,
K. A. Janulewicz,
Henryk Fiedorowicz
Publication year - 2021
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.426642
Subject(s) - laser , extreme ultraviolet , plasma , extreme ultraviolet lithography , atomic physics , optics , absorption (acoustics) , spectroscopy , materials science , emission spectrum , photon energy , wavelength , physics , photon , spectral line , quantum mechanics , astronomy
Characterization of Xe emission in the spectral range between 1 and 1.5 keV is presented in the case when the laser-plasma is generated by nanosecond laser pulse irradiation of a double stream Xe/He gas-puff target. Gas target density was estimated using extreme ultraviolet (EUV) radiography. Emission spectral characteristics in the wavelength range from 0.8 to 5.2 nm were determined by using a flat field SXR spectrometer. Significant emission was recorded in two high-energy bands, the first one at wavelengths 0.8-1.6 nm (photon energy range 0.78-1.5 keV) and the second one at 1.6-2.5 nm (0.5-0.78 keV). Both plasma size and photon yield in each band were measured separately to individually assess radiation and source characteristics. Moreover, a proof-of-principle experiment for near-edge X-ray absorption fine structure spectroscopy of metallic sample near the L 2,3 absorption edge was performed to show one of the applicability areas of such a compact source.