Open AccessMo/Si lamellar multilayer gratings with high efficiency and enhanced resolution for the x-ray region of 1000–1700eV
Author(s) -
Yufei Feng,
Qiushi Huang,
Yeqi Zhuang,
Andréy Sokolov,
Stephanie Lemke,
Runze Qi,
Zhong Zhang,
Zhanshan Wang
Publication year - 2021
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.422483
Subject(s) - lamellar structure , materials science , grating , optics , diffraction efficiency , diffraction grating , diffraction , sputtering , groove (engineering) , optoelectronics , surface finish , resolution (logic) , surface roughness , thin film , composite material , nanotechnology , physics , artificial intelligence , computer science , metallurgy
The d-spacing of the multilayer lamellar grating was theoretically optimized to improve the energy resolution and maintain a high efficiency. Based on the study of the growth behavior of Mo/Si multilayer on the lamellar grating under different sputtering pressures, Ar gas pressure of 1 mTorr was selected, which can fabricate the multilayer with lower roughness and a good replication of the groove shape. An absolute diffraction efficiency of 25.6% and a Cff factor of 1.79 were achieved for the -1st order of the Mo/Si lamellar multilayer grating at an energy of 1700 eV.