Open AccessPlanar refractive lenses made of SiC for high intensity nanofocusing
Author(s) -
Mikhail Lyubomirskiy,
Bart Schurink,
Igor A. Makhotkin,
Dennis Brueckner,
Felix Wittwer,
Maik Kahnt,
Martin Seyrich,
Frank Seiboth,
F. Bijkerk,
Christian G. Schroer
Publication year - 2021
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.416223
Subject(s) - optics , materials science , silicon carbide , lens (geology) , beamline , planar , fabrication , lithography , synchrotron radiation , x ray optics , etching (microfabrication) , gradient index optics , photolithography , refractive index , synchrotron , electron beam lithography , liga , optoelectronics , resist , beam (structure) , x ray , physics , nanotechnology , medicine , computer graphics (images) , alternative medicine , pathology , layer (electronics) , computer science , metallurgy
We report on the manufacturing and testing of the first nanofocusing refractive lenses made of single-crystal silicon carbide. We introduce the fabrication process based on lithography, followed by deep isotropic etching. The lenses were characterized at the energy of 12 keV at the beamline P06 of the synchrotron radiation source PETRA III. A focal spot of 186 nm×275 nm has been achieved with a lens working distance of 29 mm.