Open AccessImproved etching uniformity using equivalent electrodes on an unconventional, irregular membrane optical element for large aperture diffractive optical telescopes
Author(s) -
Jingwen Zhang,
Zhiwei Li,
Junming Shao,
Dun Liu,
Bin Fan,
Bincheng Li
Publication year - 2020
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.410100
Subject(s) - materials science , etching (microfabrication) , electrode , optics , aperture (computer memory) , fabrication , plasma , optoelectronics , plasma etching , nanotechnology , acoustics , physics , medicine , alternative medicine , layer (electronics) , quantum mechanics , pathology
The etching uniformity of diffractive membrane optical elements with an irregular shape was investigated. A deteriorative uniformity of electron number density and electron temperature was found according to finite element analysis of plasma discharge. A designable equivalent electrode was proposed to weaken the influence of introducing the unconventional, irregular sample. Improved uniformity of etching depths was demonstrated experimentally, assisting by the designable equivalent electrode. The demonstration of the designable equivalent electrode provides a beneficial solution for the fabrication of unconventional optical elements and an effective means for adjusting and controlling plasma characteristics.