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Random residual neural network–based nanoscale positioning measurement
Author(s) -
Chenyang Zhao,
Li Yang,
Yongtao Yao,
Daxiang Deng
Publication year - 2020
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.390231
Subject(s) - nanomanufacturing , computer science , artificial neural network , residual , artificial intelligence , calibration , template matching , computer vision , pattern recognition (psychology) , optics , materials science , algorithm , image (mathematics) , nanotechnology , statistics , physics , mathematics
In the field of positioning measurement, a combination of complex components, a stringent environment, and time-consuming calibration are the main limitations. To address these issues, this paper presents a deep learning-based positioning methodology, which integrates image processing with nanomanufacturing technology. Non-periodic microstructure with nanoscale resolution is fabricated to provide the surface pattern. The main advantage of the proposed microstructure is its unlimited measurement range. A residual neural network is used for surface pattern recognition to reduce the search area, a survival probability mechanism is proposed to improve the transmission efficiency of the network layers, and template matching and sub-pixel interpolation algorithms are combined for pattern matching. The proposed methodology defines a comprehensive framework for the development of precision positioning measurement, the effectiveness of which was collectively validated by pattern recognition accuracy and positioning measurement performance. The trained network exhibits a recognition accuracy of 97.6%, and the measurement speed is close to real time. Experimental results also demonstrate the advantages and competitiveness of the proposed approach compared to the laser interferometer method.

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