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Multifocal microlens arrays using multilayer photolithography
Author(s) -
SangIn Bae,
Ki-Soo Kim,
SungPyo Yang,
KyungWon Jang,
KiHun Jeong
Publication year - 2020
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.388921
Subject(s) - microlens , photolithography , photomask , materials science , optics , microfabrication , lens (geology) , wafer , focal length , optoelectronics , fabrication , resist , nanotechnology , medicine , physics , alternative medicine , layer (electronics) , pathology
We report a new microfabrication method of multifocal microlens arrays (MF-MLAs) for extended depth-of-field (DoF) using multilayer photolithography and thermal reflow. Microlenses of different focal lengths were simultaneously fabricated on a single glass wafer by using repeated photolithography with multiple photomasks to define microposts of different thicknesses and concurrent thermal reflow of multi-stacked microposts. The diverse lens curvatures of MF-MLAs are precisely controlled by the thickness of the micropost. Hexagonally packaged MF-MLAs clearly show three different focal lengths of 249 µm, 310 µm, and 460 µm for 200 µm in lens diameter and result in multifocal images on a single image sensor. This method provides a new route for developing various three-dimensional (3D) imaging applications such as light-field cameras or 3D medical endoscopes.

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